Plasma Generators

OEM RF Products

The 'Industry Standard' RF power supply for plasma processing in semiconductor and data storage industries. The 13.56MHz frequency OEM range is available from 650W to 2,750W and have unprecedented reliability, unconditional RF stability and power control accuracy. They come as standard equipment on many OEM tools for both Etch and CVD.

Genesis RF Products

With a choice of three frequency ranges and power levels ranging from 1,250W to 8,500W and higher, there's a compact Genesis model to suit any etch, sputtering or CVD application. Low parts count and a rugged RF power section, the product of ENI's 27 years of design and development experience, offers improved performance during the critical chamber ignition and tuning phases of plasma processes. Genesis products offer an easy interface upgrade path for older OEM series generators.

RF Matchworks®

Digitally controlled impedance matching networks are rated up to 10,000W and available for three different frequency ranges. They feature accurate auto-tune as well as preset and full manual tuning capability. Designed to match ENI's range of RF Generators, the Matchwork series can also be used with other 13.56MHz plasma generators having a 50O impedance.

DC Plasma Generators

Available in a compact package, from 5kW to 60kW, ENI DC Plasma Generators offer unsurpassed Arc detection and control. The option of an 'Arc Kill' Arc Suppression board reduces the arc energy to <0.001J (see graph opposite), resulting in lower defects and higher yields. ENI DC Generators are standard fitment on many OEM PVD systems.

Service, Calibration and Repair

With the recent addition of an ENI service facility at the MKS UK headquarters in Altrincham, we are now able to offer a high quality repair and calibration service from the manufacturer of your power supply or match network. Contact Steven Fraser at Scotech for further info.